A great deal of work still remains for getting EUV mask blanks ready for manufacturing, but our cleaning methodology has removed another barrier. We are well positioned for the tasks ahead. |
Cleaning of defects is a critical and necessary step in generating a zero-defect mask blank, because defects in the substrate become defects in the multilayer, which ruins the mask blank. |
This achievement is a critical and necessary step in generating a zero-defect mask blank. |
This achievement is a critical and necessary step in generating a zero-defect mask blank. It demonstrates that the MBDC now has world-class cleaning capability in addition to our world-class deposition expertise. |